《《2016林龙－人工晶体学报－氧气流量对射频磁控溅射制备Cu_2O薄膜性能的影响》》.pdf

39 5 人 工 晶 体 学 报 V ol. 39 N o. 5 2010 10 JOURNAL O F SYNTHET IC CRY STA LS O c tober, 20 10 Cu O 2 林 龙,李斌斌,鲁林峰,江 丰,沈鸿烈 , 2 100 16 ) : Cu O , X XRD ) 2 A FM ) X XPS) Cu O : 4. 2 sccm 2 , Cu O, , 2. 29 eV, p 2 2 1016 cm3 XPS Cu 2p O 1s, Cu + 1 3 /2 : ; ; ; ; : O 484 : A : 1000985X 2010) Effect ofOxygenFlowRateon thePropertiesofCuprousOxide Thin Films Sputtered byRF agnetron LIN Long, LIBinbin, LULinf eng, JIANG Feng, SHEN H onglie C ollege of M aterial S cience and T echn ology, N anj ing U n iversity of A eron aut ics and A s tronau tics, N anjing 2 100 16, Ch ina) (Received 26April 2010, accepted 6 ay 20 10) Abstract:Cuprous ox ide Cu O ) thin f ilm s w ere deposited on g lass substrate by m agnetron sputtering 2 m ethod. T he influence o f oxygen flow rate on the propert ies o f Cu O thin film s w as investigated by X ray 2 diffraction XRD ), UV v is spectrophotom eter, atom ic force m icroscope AFM ) and X ray pho toe lectron spe