电子束暴光介绍.ppt

Electron Beam Lithography;Patterning techniques The electron beam lithography Applications of the EBL Future oportunities for EBL;Criteriums about different techniques Resolution Speed Easy fabrication Cost;Patterning Techniques;1) Optical Lithography;Resolution Limits;Resolution Limits;Resolution Limits;b) Extreme Ultraviolet Lithography ;c) X Ray;2) Nanoimprint;EUV soon in fabrication NanoimprintE beamfor 22nm X Rays difficult;The electron beam lithography;Electron Beam Direct Write;Electron Beam Direct Write;Specifications, a real example;Electron Projection Lithography;Electron Projection Lithography;Electron beam resists;EBL resists;Resist limitations;Applications of Electron Beam Lithography;Nanopatterning on nanoparticles;Nanowires;Nanopillars;Gratings;Micro Ring Resonators;Nanofluidic Channels;Industrial Applications;Some Applications of E-Beam Lithography;Future opportunities for electron beam lithography;Principle Full control over a very thin body region by two gates Fabrication thanks to e-beam - Beam diameter smaller than 2nm - Low energy (5 keV) - High resolution organic resist - Overlay accuracy thanks to scanning of registration marks - Silicon etching;High performance devices Transfer characteristic similar to those obtained with bulk transistors Appl: SRAM because high density + capability of driving a large bitline load Low power applications High on-current, very low off-current;Single electron transistor - Concept;Single electron transistor - Fabrication;Single electron transistor - Applications;Photonic crystals - Concept;2D photonic crystals;3D photonic crystals; Conclusion;Thank you for your attention