CVD化学及薄膜工艺2040223.ppt

化学气相淀积与薄膜工艺Chemical Vapor Deposition Thin Film Technology 孟广耀 Tel:3603234 Fax:3607627 mgym@ustc.edu.cn 中国科学技术大学 材料科学与工程系 固体化学与无机膜研究所 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. Ch.3 化学气相淀积系统中的质量输运 － 原理和和技术 3。1 CVD系统中物质输运过程及其作用 3。2 气体的一些性质 （1）气态方程 （2）输运性质 3。3开管气流系统中的质量输运 （1）水平反应管中的气流状态 （2）气态组分向生长表面的转移 （3）实例：Ga – HCl- NH3-H2 体系 3。4 封管系统中的质量输运 （1）系统总压和输运机制 （2）输运速率的计算 （3）实验验证 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. 前驱物气体 衬底 托架 卧式反应器 衬底 立式反应器 Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. 气相外延砷化镓单晶薄膜 Reaction system: Ga – AsCl3 – H2 Ga source AsCl3 + 3/2H2 = 1/4 As4 + 3 HCl reactions: Ga + HCl = GaCl + H2 Deposition: 1/4 As4 + GaCl + 1/2 H2 = GaAs + HCl Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. SiHCl3+H2=Si+3HCl Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. Low-Pressure CVD System Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. Plasma-Enhanced CVD Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. ECR-CVD(ECR: electron cyclotron resonance) Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. PECVD (plasma enhanced CVD) Evaluation only. Created with Aspose.Slides for .NET 3.5 Client Profile 5.2.0.0. Copyright 2004-2011 Aspose Pty Ltd. LPCVD (low p