4MV静电加速器用高频离子源的研制-南京师范大学学报工程技术版）.PDF

5 3 () V o.l 5 N o. 3 2005 9 JOURNAL OF NAN JING NORM AL UN IVER SITY ( ENG IN EER ING AND TE CHNOLOGY ) Sep, 2005 4MV静电加速器用高频离子源的研制 1 1 1 1 1 2 1 孙振武 , 李 涛 , 郑世全, 李玉晓, 姜胜男, 王建勇 , 霍裕平 ( 1. , 450052; 2. , 10087 1) [] 4 MV ; , ; , , , ; ; ; , 580 V8 @ 10- 4 P a1. 65 kV 2 1 kV , 178 LA . [] , , , [ ] T L50 3. 4, [] A, [] 1672- 1292( 2005) 0 3-0008-04 Developing a RF Ion Source for 4MV E lectrostatic Accelerator 1 1 1 1 1 SUN Zhenw u , L I Tao , ZHENG Sh iquan , L IY ux iao , J IANG S hengnan 2 1 W ANG J ianyong , HUO Y up ing ( 1. Schoo l o Phy sics Eng ineering, Zh engzhou U n iversity, H enan Z hengzhou 450052, Ch ina; 2. In stitute o H eavy Ion Phy sics, P ek ing U n ivers ity, Beijing 10087 1, Ch ina) Abstract: A RF ion source o r 4M V e lectrostatic acce le ra to r is designed and debugged. The in luence o variou s ac- tors on the RF ion source d ischarg ing is stud ied. It is ound that keeping the inne r w a ll o discharge bottle clean, loading ho rizon talm agnet irstly, shortening the length o copper rope and e lectrop la ting itw ith silver can ev idently re- duce the low est d ischarge vo ltage. R e lationship s betw een ion beam intensity and som e param eters includ ing plate volt- age o the osc illa tor, gas pressure and extraction vo