软化学法制备氧化亚铜及光催化性研究 毕业论文.doc

软化学法制备氧化亚铜及光催化性研究 摘　要 氧化亚铜(Cu2O)具有优越的光电性质，是一种具有广泛用途的材料，而且它的制备方法很多。本论文采用化学浴沉积法制备了纳米Cu2O 薄膜, 采用X射线衍射(XRD)来测试薄膜的晶体结构；扫描电子显微镜观察薄膜表面形貌；紫外分光光度计测试薄膜的光学性质，研究了化学浴沉积工艺参数: 化学浴沉积法有利于制备高质量的纳米Cu2O薄膜; 最佳反应温度为70～80℃,此温度范围内Cu2O 薄膜的膜厚在一定范围内随着沉积时间线性增加, 制备的薄膜纯度较高, 表面较平整和致密, Cu2O 粒径为14～22 nm , 其禁带宽度为2.01 eV. 关键词: 纳米氧化亚铜; 薄膜；化学浴沉积法; 光催化性 Abstract Cu2O is one of the widest used materials depending on its excellent photoelectric properties. Cu2O films with nano-sized crystalline were prepared by chemical bath deposition and characterized with XRD and TEM, in order to explore the best film-forming conditions; Through characterized to ensure the crystal structure by X-ray diffraction (XRD), observe morphology by scanning electron microscope (SEM), and study optical properties by UV-Vis spectrophotometer. The effects on the thin films of experimental parameters including duration time, solution ratio, pH value of deposition solution, bath temperature, pre-treatment of substrate etc. have been investigated in detail during the deposition processing. The results showed that chemical bath deposition method is conductive to the improved preparation of high-quality thin films of nano-Cu2O; the reaction temperature is 70～80 ℃, thickness of Cu2O film increases linearly with the deposition time, the films obtained a perfect purity, and the smooth surface and dense, Cu2O has a particle size of 14～22 nm, the band gap is 2.01 eV. [Key words]: Nano-Cu2O; thin film; Chemical Bath Deposition. 目录 摘　要 1 Abstract 2 目录 3 第一章 绪 论 6 1.1课题背景及意义 6 1.2 Cu2O薄膜的国内外研究现状 7 1.2.1 Cu2O薄膜的制备方法 7 1.2.2 水浴法制备Cu2O薄膜的研究现状 9 1.3 Cu2O薄膜研究存在的主要问题 10 1.3.1 粒径从微米级减小到纳米级 10 1.3.2 Cu2O薄膜异质结 10 1.3.3 调控电导率的尝试 11 1.4本论文主要目的和研究内容 11 第二章 实验部分 13 2.1沉积机理 13 2.1.1溶度积与离子积的概念 13 2.1.2 过饱和度的概念 13 2.1.3 涉及的反应方程式 14 2.1.4 CBD薄膜的两种生长模式 15 2.1.5 CBD的动力学过程 15 2.2试验仪器与药品 16 2.3 试验步骤 16 2.3.1 衬底预处理 16 2.3.2 配制沉积液 16 2.3.3 薄膜的制备和粉体的收集 17 2.3.4 试验参数改变 17 2.4试验流程图 17 2.5 薄膜的表征 17 2.5.1 物相分析 17 2.5.2 薄膜表面形貌测定 19 2.5.3 薄膜光学性能测定 19 第三章 制备薄膜的前期探索 21