FeGe纳米多层膜的结构、磁性质和输运特性的开题报告.docx

FeGe纳米多层膜的结构、磁性质和输运特性的开题报告

Abstract

Inthisproposal,weaimtoinvestigatethestructure,magneticproperties,andtransportcharacteristicsofFeGenanoscalemultilayerfilms.TheproposedresearchwillinvolvethegrowthofFeGemultilayerfilmsusingsputteringtechniques,andcharacterizationthroughadvancedtechniquessuchasX-raydiffraction,transmissionelectronmicroscopy,andmagnetometry.ThetransportpropertiesofthefilmswillbefurtherexaminedusingHalleffectmeasurements.Theultimategoalofthisstudyistocontributetothefundamentalunderstandingofmagneticthinfilmsandtopotentiallypavethewayforinnovativeapplicationsinmagneticandspintronicdevices.

Introduction

Thinfilmsoftransitionmetalcompounds,suchasFeGe,haveattractedconsiderableattentionduetotheirmagneticandelectronicpropertiesthatcanbetailoredbycontrollingtheirstructureandthickness.FeGebelongstothefamilyoftransitionmetalsilicidesandgermanides,whichexhibitdiversephysicalproperties,includinggiantmagnetoresistance(GMR),tunnelmagnetoresistance(TMR),andspindependenttransport.FeGehasahighmagnetostrictionconstant,allowingforefficientcouplingbetweenmagneticandmechanicaldegreesoffreedom,whichisessentialforthedevelopmentofmagnetoelasticdevices.Additionally,FeGehasaCurietemperature(TC)ofapproximately200K,whichisrelativelyhighcomparedtoothertransitionmetalcompounds.

Inthisproposedstudy,weaimtogrowFeGenanoscalemultilayerfilmsandinvestigatetheirstructuralandmagneticproperties.ThefilmswillbegrownusingRFmagnetronsputtering,whichisawell-establishedtechniquefordepositingthinfilmswithprecisethicknesscontrol.ThestructuralpropertiesoftheFeGemultilayerfilmswillbecharacterizedusingadvancedtechniquessuchasX-raydiffraction(XRD)andtransmissionelectronmicroscopy(TEM).XRDallowsforthedeterminationofcrystallographicorientat