阵列式碳纳米管膜的CVD法制备工艺及应用研究的中期报告.docx

阵列式碳纳米管膜的CVD法制备工艺及应用研究的中期报告 摘要： 碳纳米管作为一种有着广泛用途的纳米材料，其制备工艺及应用领域一直备受关注。本文介绍了阵列式碳纳米管膜的CVD（化学气相沉积）法制备工艺及其在电子器件领域中的应用研究。首先介绍了阵列式碳纳米管的结构及制备原理，然后详细阐述了CVD法的制备步骤及影响因素，并通过实验研究得出最优制备条件。最后，结合当前电子器件领域中碳纳米管膜应用的研究现状，探讨了阵列式碳纳米管膜在场效应晶体管、太阳能电池等器件中的应用前景及挑战。 关键词：碳纳米管；CVD法；阵列式膜；电子器件 Abstract: Carbon nanotubes, as a kind of widely used nanomaterials, have attracted great attention in their preparation techniques and application fields. This report introduces the CVD (chemical vapor deposition) method for preparing arrayed carbon nanotube films and its application research in the field of electronic devices. Firstly, the structure and preparation principle of arrayed carbon nanotubes are introduced. Then, the preparation steps and influencing factors of CVD method are elaborated in detail, and the optimal preparation conditions are obtained through experimental research. Finally, in combination with the current research status of carbon nanotube film applications in the field of electronic devices, the prospects and challenges of arrayed carbon nanotube films in devices such as field-effect transistors and solar cells are discussed. Keywords: Carbon nanotubes; CVD; Arrayed film; Electronic devices.