平场全息凹面光栅设计方法及制作关键技术研究的中期报告.docx

平场全息凹面光栅设计方法及制作关键技术研究的中期报告

Abstract:Inordertosolvetheproblemofpoorimagequalitycausedbytheunevenspacingandaberrationoftheholographicgratinginthedesignandproductionoftheflat-fieldholographicconcavegrating,thisreportproposesadesignandproductionmethodfortheflat-fieldholographicconcavegratingbasedonanovelopticalfieldequationmodel.Thismethodcanaccuratelypredictthediffractionefficiencyandspectralresponseofthegrating,andobtaintheoptimalparametersfordesigningandproducingthegrating.Inaddition,thisreportalsointroducesthekeytechnologiesintheproductionprocess,includinglaserinterferencelithography,photoresistspincoatinganddevelopment,andplasmaetching.Throughaseriesofexperimentsandcomparisons,itisconcludedthattheproposedmethodandproductionprocesscaneffectivelyimprovetheimagequalityoftheflat-fieldholographicconcavegratingandhavegreatapplicationpotentialinmanyfields.

Keywords:flat-fieldholographicconcavegrating,opticalfieldequationmodel,diffractionefficiency,spectralresponse,laserinterferencelithography,photoresistspincoatinganddevelopment,plasmaetching.

Introduction

Flat-fieldholographicconcavegratingshavebeenwidelyusedinastronomicalspectroscopy,laserfrequencydoubling,andotherfieldsbecauseoftheirexcellentaberrationcorrectionabilityandhighresolution.However,inthedesignandproductionofflat-fieldholographicconcavegratings,theunevenspacingandaberrationoftheholographicgratingoftenleadtopoorimagequality,whichseriouslyaffectstheirapplicationperformance.

Inthisreport,adesignandproductionmethodforflat-fieldholographicconcavegratingsbasedonanovelopticalfieldequationmodelisproposed.Thismethodcanaccuratelypredictthediffractionefficiencyandspectralresponseofthegrating,andobtaintheoptimalparametersfordesigningandproducingthegrating.