明道大学采购报价单.doc

明道大學採購報價單 採購單號： 098N04456及098N04459 品 名： In-line Hot-Wire CVD system採購 項次 項目 規 格 預算金額 廠牌/型號 單位 數量 單 價 金 額 1 In-line Hot-Wire CVD system(連續式熱燈絲化學氣相沉積) 一、General description (基本描述) The equipment is a horizontal inline Hot Wire CVD system for coating of planar substrates. It is designed to deposit amorphous Silicon/ Germanium thin film on glass substrate for solar cell applications. 1-1 Characteristic (特性) (1) Reliable isolation gate valve design and good quality. (2) Each chamber is equipped with optical sensor. (3) Robust glass substrate transportation. (4)Integrated with substrate heating, rotation and linear motion module. (5) PLC control system. Industrial PC is used for HMI and data logging. (6) 15” TFT touch panel LCD Human-Machine Interface. (7) User friendly interface operation. (8) Power supply and vacuum safety interlock. 二、System configuration (系統組態) 2-1 6,500,000 SET 1 1 In-line Hot-Wire CVD system(連續式熱燈絲化學氣相沉積) 2-2 Chamber function description (腔體配件說明) Entry load-lock chamber(load 腔體)： ● Pickup wafer substrate (晶圓載台) ● Load - from ATM to vacuum ● View port (窺視孔) ● Stainless steel 304 (304不銹鋼腔體) Process chamber: P type layer(p-type 製程腔體) ● HWCVD deposition process for p-type layer(p-layer 製程) ● Substrate heating (基板加熱系統) ● Substrate rotation and linear motion(基板升降及旋轉系統) ● Adjustable shower head module -uniform gas distribution(可調整的Shower header模組) ● View port with manual shutter(可調整式之窺視孔) ● IR thermometer detected port(紅外線感應器) ● Stainless steel 304 (304不銹鋼腔體) Process chamber:- Intrinsic and N type layer (i/n-type 製程腔體) ● HWCVD deposition process for intrinsic and n-type layer(連續式熱燈絲化學氣相沉積i/n層) ● Substrate heating (基板加熱系統) ● Substrate rotation and linear motion(基板升降及旋轉系統) ● Adjustable shower head module -uniform gas distribution(可調整的Shower header模組) ● View port with manual shutter(可調整式之窺視孔) ● IR thermometer detected port(紅外線感應器) ● Stainless steel 304 (304不銹鋼腔體) Exit load-lock chamber(unload 腔體) ●Pickup wafer substrate (晶圓載台) ● Unload